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Physico chemistry of solids, thin films, biotechnologies
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> Research > FM2N

Development of low-cost, scalable chemical deposition methods for the fabrication of high quality functional materials

OBJECTIVES
Chemical deposition methods for material synthesis are at the core activity of the FM2N team. Our expertise concerns mainly Metalorganic Chemical Vapor Deposition (MOCVD), Aerosol Assisted Chemical Vapor Deposition (AACVD), Sol gel, Chemical Bath Deposition (CBD), and, more recently, Spatial Atomic Layer Deposition (SALD).

COLLABORATIONS

Highlights

The synthesis of materials by chemical methods is used in the different team activity axes. Our aim is developing low cost, scalable chemical methods for the fabrication of high quality functional materials. In this frame, we develop our reactors and combine different techniques to adapt methods to the functional objective.

Currently, the requirement for low thermal budget processing is addressed by the assistance of MOCVD techniques via plasma or UV irradiation, or by developing innovating solutions such as SALD.

Our activity concerns also the evaluation of precursors for MOCVD and their influence on functional properties.






Plasma Assisted Aerosol Chemical Vapor Deposition reactor developed at LMGP

Main publications

N. Dechoux, , C. Jiménez, P. Chaudouët, L. Rapenne, E. Sarigiannidou, F. Robaut, S. Petit, S. Garaudée, L. Porcar, J. L. Soubeyroux, P. Odier, C. E. Bruzek and M. Decroux,
Textured YBCO films grown on wires: application to superconducting cables, Superconductor Science and Technology 25(12):(2012).

R. Salhi, C. Jiménez, J. L. Deschanvres, Y. Guyot, O. Chaix-Pluchery, L. Rapenne, R. Maâlej and M. Fourati,
Preparation and microstructural properties of erbium doped alumina–yttria oxide thin films deposited by aerosol MOCVD, Journal of Luminescence 142(0):(2013) 52-56 .

S. Guillemin, V. Consonni, E. Appert, E. Puyoo, L. Rapenne and H. Roussel,
Critical Nucleation Effects on the Structural Relationship Between ZnO Seed Layer and Nanowires, The Journal of Physical Chemistry C 116(47):(2012) 25106-25111.

F. Weiss, M. Audier, A. Bartasyte, D. Bellet, C. Girardot, C. Jiménez, J. Kreisel, S. Pignard, M. Salaun and C. Ternon,
Multifunctional oxide nanostructures by metal-organic chemical vapor deposition (MOCVD), Pure and Applied Chemistry 81(8):(2009) 1523-1534.

M. Houmard, E. H. M. Nunes, D. C. L. Vasconcelos, G. Berthomé, J. C. Joud, M. Langlet and W. L. Vasconcelos,
Correlation between sol–gel reactivity and wettability of silica films deposited on stainless steel, Applied Surface Science 289(0):(2014) 218-223.

D. Muñoz-Rojas, J. L. MacManus-Driscoll,
Spatial Atmospheric Atomic Layer Deposition: A new laboratory and industrial tool for low-cost photovoltaics, Materials Horizons, 1, 314-320, 2014.

Date of update September 8, 2014

Univ. Grenoble Alpes