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New FM2N paper by C. Ternon

Published on September 30, 2015
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Communique, News August 7, 2015

The paper "Low Temperature Processing to Form Oxidation Insensitive Electrical Contact at Silicon Nanowire/Nanowire Junctions" has been published in Advanced Electronic Materials.

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You will find http://onlinelibrary.wiley.com/doi/10.1002/aelm.201500172/abstract">here the paper by  Céline Ternon. Here you have the abstract:

"The development of functional devices compatible with standard microelectronic processes is central to the More-than-Moore and Beyond-CMOS (complementary metal oxide semiconductor) electronic fi elds. Devices based on nanowires (NWs) are very promising, but their integration remains complex and submitted to variability limiting the potential scalability. The fi eld of fl exible electronics is another one in which the standard microelectronic industry struggles to propose a solution. Despite tremendous progress, organic materials remain highly sensitive to oxygen and humidity and deteriorate under UV irradiation, thus limiting their long-term operation. Here, it is shown that Si NW networks, also called Si nanonets, provide an easy-to-process single answer to develop flexible electronics and NW-based devices. As a major contribution to the state of the art, it is demonstrated that stable Si NW–NW junctions, insensitive to oxidation, can be formed with low variability, which opens up a new route to form
reproducible and reliable devices, with long-term performances, presumably over several years, for NW-based or flexible devices using Si as active element."
http://onlinelibrary.wiley.com/doi/10.1002/aelm.201500172/abstract">DOI: 10.1002/aelm.201500172

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Date of update November 21, 2015

Univ. Grenoble Alpes