OBJECTIVES To formulate sols leading to the deposition of functional thin films
Polymeric sols are formulated to produce hybrid organic/inorganic or all-inorganic photoresists for optical applications. Hybrid photoresists rely on the photo-polymerization of organic radicals (epoxy, methacrylate), while all-inorganic photoresists are based on the photolytic decomposition of alkoxo-chelate complexes. For instance, TiO2 submicronic diffraction gratings are studied for photovoltaic, thermo-solar, LED lighting, or smart window applications in outdoor atmosphere, which take advantage of the high refractive index and self-cleaning functionality of a titanium oxide thin film.
Submicronic TiO2 diffraction gratings written by “in fly” interferometric lithography on all-inorganic photoresist
S. Briche, D. Riassetto, C. Gastaldin, C. Lamarle, O. Dellea, D. Jamon, E. Pernot, M. Labeau, G. Ravel, M. Langlet, Sol-Gel processing and UVA patterning of epoxy-based hybrid organic-inorganic thin films, J. Mater. Sci. 43 (2008) 5809.
S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, E. Pernot, H. Roussel, O. Dellea, Y. Jourlin, M. Langlet, New insights in photo-patterned sol-gel derived TiO2 films, J. Mater. Sci., 46 (2011) 1474.
V. Gâté , G. Bernaud, C. Veillas, A. Cazier, F. Vocanson, Y. Jourlin, M. Langlet, Fast dynamic interferometric lithography for large sub-micrometric period diffraction gratings production, Opt. Eng., 52(9) (2013) 091712.
V. Gâté, Y. Jourlin, F. Vocanson, O. Dellea, G. Vercasson, S. Reynaud, D. Riassetto, M. Langlet, Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist, Opt. Mater., 35 (2013) 1706.