SYNTHESIS OF THIN FILMS AND NANOMATERIALS BY MOCVD
Metal Organic Chemical Vapor Deposition (MOCVD) is a versatile technique which allows the synthesis of complex materials with a high degree of control on crystallinity, on stoichiometry, and on deposition rate. Our research activity is mainly focused on thin films and nanowires synthesis, and on low thermal budget processes by plasma or photo-assisted MOCVD.
This technique offers also advantages over other physical deposition processes:
a versatile composition control,
the ability to coat complex shape and larges areas.