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Synthèse et propriétés de monocristaux, de poudres, films minces ou hétérostructures

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LMGP Seminar : L. Bergerot - MOCVD Strontium-doped copper oxide thin films as p-type transparent conductive oxide : growth and characterization

Publié le 8 avril 2014
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Colloque / Séminaire 14 mai 2014
Wednesday at 2:00 pm - LMGP conference room - 2nd floor
LMGP (UMR 5628 CNRS / Grenoble INP)
3 parvis Louis Néel - 38000 Grenoble
Accès : TRAM B arrêt Cité internationale
Free entrance - No registration
Laurent Bergerot
LMGP PhD student. Supervisors : Jean-Luc Deschanvres & Carmen Jimenez (LMGP)

MOCVD Strontium-doped copper oxide thin films as p-type transparent conductive oxide : growth and characterization


Abstract
Transparent conducting oxides are used in a wide variety of applications, such as solar cells or flat panel displays. However, the potential applications are limited by the fact that those with the best characteristics are all n-type, when those that are p-type have conductivities that are one order of magnitude inferior. Cuprous oxide Cu2O appears as a promising material for use as a p-type transparent conducting oxide. According to theoretical simulation by M. Nolan et al, it is possible to tune its properties by doping it with strontium.

This work aims at growing and characterizing thin film of cuprous oxide doped with strontium by metal-organic chemical vapour deposition method. The influence on optical and electronic properties of deposition parameters such as substrate temperature and oxygen partial pressure in the reactor, as well as the influence of dopant concentration, are explored. In addition, the effects of thermal annealing on deposited thin films are studied.

The combination of strontium doping and post deposition annealing have led to the best film properties. Such films show promising results, with transparencies of approximately 70% and resistivities as low as 100 to 101 Ω.cm.

Effects of deposition parameters, doping with strontium and annealing on the structural, optical and electronic properties of the thin films, as well as an optimization of the different parameters, will be presented.

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mise à jour le 24 avril 2014

  • Tutelle CNRS
  • Tutelle Grenoble INP
Univ. Grenoble Alpes