Aller au menu Aller au contenu
Physico chemistry of solids, thin films, biotechnologies
Applications for micro & nano- technologies, energy, health ...

> Research > Research-FunSurf

Paper by V.H. Nguyen

Published on December 30, 2018
A+Augmenter la taille du texteA-Réduire la taille du texteImprimer le documentTélécharger au format PDFEnvoyer cette page par mail Partagez cet article Facebook Twitter Linked In Google+ Viadeo
Communique from November 28, 2018 to December 20, 2018

The paper "Quantum-tunneling metal-insulator-metal diodes made by rapid atmospheric pressure chemical vapor deposition" has been published in Advanced Functional Materials.

abdullahpub.png

abdullahpub.png

Here  you will find Viet´s paper
"A quantum-tunneling metal-insulator-metal (MIM) diode is fabricated by atmospheric pressure chemical vapor deposition (AP-CVD) for the first time. This scalable method is used to produce MIM diodes with high-quality, pinhole-free Al2O3 films more rapidly than by conventional vacuum-based approaches. This work demonstrates that clean room fabrication is not a prerequisite for quantum-enabled devices. In fact, the MIM diodes fabricated by AP-CVD show a lower effective barrier height (2.20 eV) at the electrode-insulator interface than those fabricated by conventional plasma-enhanced atomic layer deposition (2.80 eV), resulting in a lower turn on voltage of 1.4 V, lower zero-bias resistance and better asymmetry of 107. "


A+Augmenter la taille du texteA-Réduire la taille du texteImprimer le documentTélécharger au format PDFEnvoyer cette page par mail Partagez cet article Facebook Twitter Linked In Google+ Viadeo

Written by David Munoz-Rojas

Date of update December 30, 2018

Univ. Grenoble Alpes