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Physico chemistry of solids, thin films, biotechnologies
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> Research > FM2N

Physical Chemistry at Interfaces, advanced structural characterization

The first objective of this research line is to control the growth of oxide thin films and nanostructures at the atomic level by investigating the growth mechanisms and kinetics at the early stage. For that purpose, we develop and use experimental means and methods for carrying in situ structural and chemical characterizations, i.e. during the synthesis. The second objective concerns advanced structural and chemical characterizations of nanostructures and nanomaterials either ex situ or in situ upon variations of external parameters (temperature, oxygen pressure, ...)

SKILLS & COMPETENCES
  • Growth methods: Metal Organic Chemical Vapor Deposition (MOCVD), Atomic Layer Deposition (ALD), Chemical Bath Deposition
  • Characterization techniques: X-ray Absorption, X-ray Surface Diffraction, Surface Crystallography, Substrate curvature mesurements, … Synchrotron Radiation


Investigations are conducted following 2 lines :

Understanding the growth of oxide thin films and nanostructures

Advanced structural and chemical characterization of nanostructures and nanomaterials

Written by Colette Lartigue

Date of update February 13, 2015

Univ. Grenoble Alpes